Mini ICP Plasma Cleaning Machine for Wafer Research
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Attributes
380 VVoltage
5 kWPower(W)
PLC, Engine, Bearing, Gearboxcore components
Providedmachinery test report
1 Yearwarranty
Providedvideo outgoing-inspection
place of origin:Guangdong, China
Weight (kg):100
brand name:BW
Plasma Source:RF inductively coupled plasma source or dual-frequency plasma source
Mechanical Transfer:Single-arm or dual-arm high-precision robotic arm
Vacuum Pump:Dry vacuum pump
Process Pressure Control:Automatic pressure regulating butterfly valve
Gas Flow Control:Mass flow controller (MFC)
Key attributes
Voltage
380 V
Power(W)
5 kW
core components
PLC, Engine, Bearing, Gearbox
machinery test report
Provided
warranty
1 Year
video outgoing-inspection
Provided
place of origin
Guangdong, China
Weight (kg)
100
brand name
BW
Plasma Source
RF inductively coupled plasma source or dual-frequency plasma source
Mechanical Transfer
Single-arm or dual-arm high-precision robotic arm
Vacuum Pump
Dry vacuum pump
Process Pressure Control
Automatic pressure regulating butterfly valve
Gas Flow Control
Mass flow controller (MFC)
Packaging and delivery
Selling Units
Single item
Lead time
Product descriptions from the supplier
1 - 2 sets
£22,55532
≥ 3 sets
£21,05164
Variations
Select nowmodel number
bw
Shipping
Shipping fee and delivery date to be negotiated. Chat with supplier now for more details.
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